Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of patterning dummy layer

Method of patterning dummy layer

US Patent 6054362 · Granted Apr 25, 2000

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Plasma ignition circuit2022
Plug structure2001
Method of fabricating self-align contact window with silicon nitride side wall2001
Method of fabricating shallow trench isolation structures2000
Method for forming semiconductor device with common gate, source and well2000
Method of making a low power SRAM1999
Adjustable method for eliminating trench top corners1999
Method of fabricating self-align contact window with silicon nitride side wall1999
Method of fabricating self-align contact window with silicon nitride side wall1998