Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Rotating anode for a wafer processing chamber

Rotating anode for a wafer processing chamber

US Patent 6077412 · Granted Jun 20, 2000

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Linearly distributed semiconductor workpiece processing tool2013
Differential signal layout printed circuit board2011
Spatially-arranged chemical processing station2005
Solution composition and method for electroless deposition of coatings free of a2005
Activation-free electroless solution for deposition of cobalt and method for dep2005
Method for electroless deposition of phosphorus-containing metal films onto copp2004
Metallized interconnection structure2002
Electrochemical methods for polishing copper films on semiconductor substrates2002
Method for depositing and/or removing material on a substrate2002
Method for depositing and/or removing material on a substrate2002
Copper-aluminum metallization2001
Multiple station processing chamber and method for depositing and/or removing ma2001