Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for making recessed field oxide for radiation hardened microelectronics

Method for making recessed field oxide for radiation hardened microelectronics

US Patent 6063690 · Granted May 16, 2000

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Framing tool2019
Minimal-energy up/down counting apparatus and method for extremely low-power app2019
Framing template tool and method of using same2018
Wafer structure for electronic integrated circuit manufacturing2017
Wafer structure for electronic integrated circuit manufacturing2017
Wafer structure for electronic integrated circuit manufacturing2017
Wafer structure for electronic integrated circuit manufacturing2017
Wafer structure for electronic integrated circuit manufacturing2016
Wafer structure for electronic integrated circuit manufacturing2016
Wafer structure for electronic integrated circuit manufacturing2016
Wafer structure for electronic integrated circuit manufacturing2016
Integrated circuit structures containing a strain-compensated compound semicondu2015