Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for depositing fluorine doped silicon dioxide films

Method for depositing fluorine doped silicon dioxide films

US Patent 6042901 · Granted Mar 28, 2000

Estimated economic value: $34,068,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Blue light blocking eyewear and method of use2023
Low power digital audio decoding/playing system for computing devices2011
Low power digital audio decoding/playing system for computing devices2010
Power management for digital devices2010
Short range wireless tracking and event notification system for portable devices2010
Low power digital audio decoding/playing system for computing devices2009
Low power digital audio decoding/playing system for computing devices2009
Low power digital audio decoding/playing system for computing devices2009
Low power digital audio decoding/playing system for computing devices2009
Personal computer integrated with personal digital assistant2008
Low-power CD-ROM player with CD-ROM subsystem for portable computer capable of p2008
Personal computer integrated with personal digital assistant2008