Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Mirror for providing selective exposure in X-ray lithography

Mirror for providing selective exposure in X-ray lithography

US Patent 6009143 · Granted Dec 28, 1999

Estimated economic value: $29,413,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Constructing an augmented reality image2025
Electric corn creamer and food grater2025
Telemetry method and system for subsurface well and reservoir logging data2019
Telemetry method and system for subsurface well and reservoir and logging data2017
Bandwidth wireline data transmission system and method2013
Apparatus and method for imaging fluids downhole2011
Method for lithography for optimizing process conditions2010
High resolution silicon-containing resist2010
Method for using negative tone silicon-containing resist for e-beam lithography2008
High Q inductor with faraday shield and dielectric well buried in substrate2004
Method of fabricating integrated coil inductors for IC devices2004
MEMS RF switch with low actuation voltage2003