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Home › Synthesis of W-Si-N films by chemical vapor deposition using WF.sub.6, SiH.sub.4 and NH.sub.3

Synthesis of W-Si-N films by chemical vapor deposition using WF.sub.6, SiH.sub.4 and NH.sub.3

US Patent 5997949 · Granted Dec 7, 1999

Estimated economic value: $10,914,000 ⓘ

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