Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Removal of fluorine or chlorine residue by liquid CO.sub.2

Removal of fluorine or chlorine residue by liquid CO.sub.2

US Patent 5976264 · Granted Nov 2, 1999

Estimated economic value: $18,540,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Systems and methods for sequencing items for sale in a live video event2024
Scalable, distributed containerization across homogenous and heterogeneous data 2020
Low stress bonding of silicon or germanium parts2018
Apparatus and method for the rapid thermal control of a work piece in liquid or 2014
Single crystal U-MOS gates using microwave crystal regrowth2014
Low temperature dielectric flow using microwaves2013
Apparatus and method for the rapid thermal control of a work piece in liquid or 2013
Method and apparatus for forming nickel silicide with low defect density in FET 2012
Structure and method for forming a salicide on the gate electrode of a trench-ga2012
Method and apparatus for forming nickel silicide with low defect density in FET 2010
Methods of base formation in a BiCOMS process2010
Air break for improved silicide formation with composite caps2010