Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High sensitivity, photo-active polymer and developers for high resolution resist applications

High sensitivity, photo-active polymer and developers for high resolution resist applications

US Patent 5955242 · Granted Sep 21, 1999

Estimated economic value: $27,467,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for growing germanium epitaxial films2016
Method for manufacturing lateral germanium detectors2013
Two-step hardmask fabrication methodology for silicon waveguides2012
Nanostructure for molecular electronics comprising collinear metal lines definin2011
Integrated circuit chip module with microchannel cooling device having specific 2011
Electronic module comprising memory and integrated circuit processor chips forme2011
Molecular sensors for explosives2010
Method for manufacturing vertical germanium detectors2010
Semiconductor integrated circuit chip packages having integrated microchannel co2007
Micro-electro-mechanical RF switch2007
Water-soluble electrically conducting polymers, their synthesis and use2007
Electrical contacts for molecular electronic transistors2006