Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Space-saving ion-implantation system installed both in and adjacent to a semiconductor manufacturing line

Space-saving ion-implantation system installed both in and adjacent to a semiconductor manufacturing line

US Patent 5945682 · Granted Aug 31, 1999

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Ion implantation system for manufacturing semiconductor device2004
Ion implantation system for manufacturing semiconductor device2004
Ion implantation system for manufacturing semiconductor device2004
Method for manufacturing a semiconductor device2003
Interconnect structure with a passivation layer and chip pad2001
Mechanism for preventing metallic ion contamination of a wafer in ion implantati1999
Water-removing exhaust system for an ion implanter and a method for using the sa1999
Faraday cup assembly for a semiconductor ion-implanting apparatus1998
Exhaust system for an ion implanter1998
Exhaust system for an ion implanter1998
Combining estimates using fuzzy sets1994
System and method for improved speech acquisition for hands-free voice telecommu1994