Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method, apparatus and computer program product for simulating ion implantation

Method, apparatus and computer program product for simulating ion implantation

US Patent 5933359 · Granted Aug 3, 1999

Estimated economic value: $24,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electro-static discharge protection device2011
Electro-static discharge protection device2008
MOS type semiconductor device having electrostatic discharge protection arrangem2007
Multifinger-type electrostatic discharge protection element2006
Ion implantation simulation method2004
Semiconductor device having a protective circuit2003
Ion implantation process simulation device realizing accurate interpolation of i1999
Method capable of accurately simulating ion implantation at a high speed1999
Simulation method for high resolution deep impurity profile1999
Ion implantation simulation method1999
Method for impurity distribution simulation1999
Method and system for simulating ion implantation for performing simulation with1998