Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus for aligning semiconductor wafer using mixed light with different wavelengths

Apparatus for aligning semiconductor wafer using mixed light with different wavelengths

US Patent 5859439 · Granted Jan 12, 1999

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photomasks for reducing thermal stress generated by heat2017
Photomasks for reducing thermal stress generated by heat2017
Photo mask including pre-alignment keys and photolithography apparatus performin2017
Blank masks for extreme ultra violet lithography, methods of fabricating the sam2016
Reflection type blank masks, methods of fabricating the same, and methods of fab2016
Blank masks for extreme ultra violet lithography, methods of fabricating the sam2014
Reflection type blank masks, methods of fabricating the same, and methods of fab2014
Semiconductor device having dummy pattern and the method for fabricating the sam2013
Backside phase grating mask and method for manufacturing the same2011
Semiconductor device having dummy pattern and the method for fabricating the sam2011
Method for detecting failure of database patterns of photo mask2008
Auto focus system using twice reflection1998