Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Secondary edge reflector for horizontal reactor

Secondary edge reflector for horizontal reactor

US Patent 5792273 · Granted Aug 11, 1998

Estimated economic value: $2,031,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods for preparing layered semiconductor structures2018
Self-disguising holster2017
Method for low temperature layer transfer in the preparation of multilayer semic2016
Methods for in-situ passivation of silicon-on-insulator wafers2014
Systems and methods for cleaving a bonded wafer pair2014
Epitaxial barrel susceptor having improved thickness uniformity2013
Low thermal mass semiconductor wafer plate2012
Low thermal mass semiconductor wafer boat2012
Low thermal mass semiconductor wafer support2011
Semiconductor wafer carrier blade2011
Modified susceptor for barrel reactor2008
Epitaxial silicon wafer with intrinsic gettering and a method for the preparatio2005