Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Film dissolution method of dissolving silica-based coating film formed on surface of a substrate

Film dissolution method of dissolving silica-based coating film formed on surface of a substrate

US Patent 5779928 · Granted Jul 14, 1998

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate treating apparatus with parallel first and second parts of substrate t2025
Substrate processing apparatus and substrate processing method2022
Gate valve2021
Polishing liquid, polishing liquid set, and substrate polishing method2021
Substrate treating method2019
Substrate treating apparatus with parallel gas supply pipes and a gas exhaust pi2019
Substrate processing apparatus2017
Multi-story substrate treating apparatus with flexible transport mechanisms and 2017
Substrate treating apparatus with substrate reordering2016
Substrate treating apparatus with parallel substrate treatment lines simultaneou2016
Substrate treating apparatus2016
Developing apparatus and developing method2015