Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Mercury vapor high-pressure discharge lamp and irradiation method, particularly for mask pattern exposure of semiconductor wafers

Mercury vapor high-pressure discharge lamp and irradiation method, particularly for mask pattern exposure of semiconductor wafers

US Patent 5650630 · Granted Jul 22, 1997

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Valve for metering a fluid2021
Valve for metering a fluid2020
Valve for metering a fluid2020
Valve for metering a fluid2019
Valve for metering a fluid2019
Backrest for a vehicle seat and vehicle seat with the backrest2019
Device for mounting a headrest in a seat structure of a vehicle seat2019
Method for producing a support structure for the backrest of a motor vehicle sea2019
Automatic seat belt retractor2018
Protection arrangement for a passenger of a vehicle, vehicle with the protection2018
Valve for metering a fluid2018
Storage compartment with magnetic dividing elements2017