Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Auxiliary mask features for enhancing the resolution of photolithography

Auxiliary mask features for enhancing the resolution of photolithography

US Patent 5636002 · Granted Jun 3, 1997

Estimated economic value: $15,587,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Deployment of custom shift array macro cells in automated application specific i2014
Signal processing circuitry with frontend and backend circuitry controlled by se2014
Fishing sinker2014
Deployment of transmission gate logic cells in application specific integrated c2014
Swiveling fishing sinker2014
Swiveling fishing sinker2013
Casting sinker2013
Phase-shifting lithographic masks with improved resolution1994
Fabrication of phase-shifting lithographic masks1994
Self-aligned method of making phase-shifting lithograhic masks having three or m1994
Single-alignment-level lithographic technique for achieving self-aligned feature1994
Method of making phase-shifting lithographic masks1992