Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Self-aligned method of making phase-shifting lithograhic masks having three or more phase-shifts

Self-aligned method of making phase-shifting lithograhic masks having three or more phase-shifts

US Patent 5308721 · Granted May 3, 1994

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Handling of flat data for phase processing including growing shapes within bins 2015
Deployment of custom shift array macro cells in automated application specific i2014
Signal processing circuitry with frontend and backend circuitry controlled by se2014
Fishing sinker2014
Deployment of transmission gate logic cells in application specific integrated c2014
Swiveling fishing sinker2014
Layout of phase shifting photolithographic masks with refined shifter shapes2013
Swiveling fishing sinker2013
Lithography modeling and applications2013
System and method for compressed post-OPC data2013
System and method for compressed post-OPC data2013
Casting sinker2013