Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent

Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent

US Patent 5630904 · Granted May 20, 1997

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Display device with touch detection function2025
Liquid crystal display device2025
Differential circuit board and semiconductor light emitting device2024
Display device2024
Substrate with light-shielding film, manufacturing method of the substrate, and 2024
Detection device and display device2024
Semiconductor light emitting device and optical subassembly2024
Substrate for display apparatus, display apparatus, and method of manufacturing 2024
Detecting device and display device2023
Detecting device and display device2023
Display device2023
Remote control device for medical system2023