Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Coil configurations for improved uniformity in inductively coupled plasma systems

Coil configurations for improved uniformity in inductively coupled plasma systems

US Patent 5578165 · Granted Nov 26, 1996

Estimated economic value: $19,413,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Objective2025
Compact high density plasma source2025
Tunable prism for optical image stabilization2024
Mobile connectivity and control of semiconductor manufacturing equipment2018
Method and apparatus for diagnosing status of parts in real time in plasma proce2017
Method and apparatus for diagnosing status of parts in real time in plasma proce2016
Clamped monolithic showerhead electrode2014
Cam-locked showerhead electrode and assembly2013
Clamped monolithic showerhead electrode2013
Method and apparatus for diagnosing status of parts in real time in plasma proce2013
Showerhead electrodes2012
Clamped monolithic showerhead electrode2012