Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and structure for improving patterning design for processing

Method and structure for improving patterning design for processing

US Patent 5477466 · Granted Dec 19, 1995

Estimated economic value: $14,396,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Dynamic calibration system and dynamic calibration method for heterogeneous sens2025
Clamping mechanism for a two wheel panel dolly2014
Method of fabricating medium-high temperature CO2 sorbents made of alkali metal 2014
Method of fabricating layered nano-carbonate used for medium-high temperature CO2012
Yield profile manipulator2011
Wafer edge expose alignment method2010
Method for calculating high-resolution wafer parameter profiles2010
Nanotube fuse structure2009
Voltage contrast monitor for integrated circuit defects2009
Apparatus for wafer patterning to reduce edge exclusion zone2008
Yield profile manipulator2008
Voltage contrast monitor for integrated circuit defects2008