Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Electron beam direct writing system for ULSI lithography with facilitated rotation and gain corrections of shot patterns and electron beam direct writing method for same

Electron beam direct writing system for ULSI lithography with facilitated rotation and gain corrections of shot patterns and electron beam direct writing method for same

US Patent 5438207 · Granted Aug 1, 1995

Estimated economic value: $24,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Carbon dioxide recovery device2025
Toner, toner storage unit, image forming apparatus and method of forming image2025
Bending device, production facility for steel sheet pile, bending method, and pr2025
Casing for gas, and tank valve device2025
Work machine2025
Visual inspection apparatus and visual inspection methods2024
Toner, method of manufacturing toner, toner storage unit, image forming apparatu2024
Production method for hat-shaped steel sheet pile2024
Gas solenoid valve2023
Gas solenoid valve2023
Method for producing H-shaped steel2022
Slide door structure2022