Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Projector for exposing photosensitive substrate

Projector for exposing photosensitive substrate

US Patent 5434647 · Granted Jul 18, 1995

Estimated economic value: $24,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Reflective mask blank and reflective mask2025
Reflective mask blank for EUV lithography2024
Reflective mask blank and reflective mask2024
Reflective mask blank for EUV exposure, and reflective mask2023
Reflective mask blank for EUV lithography2023
Reflective mask blank for EUV exposure, and reflective mask2022
Reflective mask blank, reflective mask, and process for producing reflective mas2021
Photomask and method of exposure using same2000
Halftone phase-shift mask and halftone phase-shift mask defect correction method1999
Process of fabricating photo-mask used for modified illumination, projection ali1997
Exposure system and illuminating apparatus used therein and method for exposing 1996
Projection exposure method and system used therefor1995