Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Electron beam lithography with reduced charging effects

Electron beam lithography with reduced charging effects

US Patent 5288368 · Granted Feb 22, 1994

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Handling of flat data for phase processing including growing shapes within bins 2015
Layout of phase shifting photolithographic masks with refined shifter shapes2013
Lithography modeling and applications2013
System and method for compressed post-OPC data2013
System and method for compressed post-OPC data2013
System and method for applying phase effects of mask diffraction patterns2012
Spacer double patterning for lithography operations2012
Self-alignment for semiconductor patterns2012
Self-aligned VIAS for semiconductor devices2012
System and method for compressed design phase contour data2012
Contact or proximity printing using a magnified mask image2011
Spacer double patterning for lithography operations2011