Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Reflection mass spectrometry technique for monitoring and controlling composition during molecular beam epitaxy

Reflection mass spectrometry technique for monitoring and controlling composition during molecular beam epitaxy

US Patent 5171399 · Granted Dec 15, 1992

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Quantum-size-controlled photoelectrochemical etching of semiconductor nanostruct2016
Apparatus and method for polymer synthesis using arrays2011
Apparatus and method for polymer synthesis using arrays2010
Molten-salt-based growth of group III nitrides2008
Method and apparatus for conducting an array of chemical reactions on a support 2005
Method and apparatus for performing large numbers of reactions using array assem2003
Method and apparatus for in situ synthesis on a solid support2003
Method and composition for chemical synthesis on an open environment support sur2002
Method and apparatus for conducting an array of chemical reactions on a support 2001
Method and composition for chemical synthesis using high boiling point organic s2001
Apparatus for diverse chemical synthesis using two-dimensional array1999
Method and apparatus for conducting an array of chemical reactions on a support 1999