Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Lithography system employing a solid immersion lens

Lithography system employing a solid immersion lens

US Patent 5121256 · Granted Jun 9, 1992

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Unifying realtime and static data for presenting over a web service2019
Method of simultaneous lithography and etch correction flow2018
Confocal microscope, system and method therefor2018
Optical-fiber-compatible sensor2017
Predicting process fail limits2016
Patterning assist feature to mitigate reactive ion etch microloading effect2016
Apparatus and methods utilizing optical sensors operating in the reflection mode2016
Optical image processing using maximum or minimum phase functions2015
Pattern improvement in multiprocess patterning2015
Pattern improvement in multiprocess patterning2015
Method of fabricating an optical-fiber-compatible sensor2014
Gyroscope utilizing torsional springs and optical sensing2014