Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of developing a high contrast, positive photoresist using a developer containing alkanolamine

Method of developing a high contrast, positive photoresist using a developer containing alkanolamine

US Patent 5094934 · Granted Mar 10, 1992

Estimated economic value: $8,091,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Coating systems and formulations with high hide and holdout2019
Paint2013
Yield improvement for Josephson junction test device formation2012
Traffic stripe composition2000
Deep UV sensitive photoresist resistant to latent image decay1994
Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquino1994
Positive photoresist containing dyes1993
High contrast high thermal stability positive photoresists having novolak resins1993
Novolak resins of lowered hydroxyl content and high contrast high thermal stabil1993
Mixed aldehyde novolak resins useful as high contrast high thermal stability pos1992
High contrast, positive photoresist developer containing alkanolamine1992
High contrast, positive photoresist developer containing alkanolamine1992