Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process and apparatus for determining the impedance of the discharge in a plasma reactor system comprising a tuning box and application to the regulation of the impedance or the ionic current in such reactor

Process and apparatus for determining the impedance of the discharge in a plasma reactor system comprising a tuning box and application to the regulation of the impedance or the ionic current in such reactor

US Patent 4990859 · Granted Feb 5, 1991

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Diffusion plasma-assisted chemical treatment apparatus1992
Process for etching by gas plasma1991
Enclosure for the treatment, and particularly for the etching of substrates by t1985