{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Fabrication of devices utilizing a wet etchback procedure", "item": "https://www.patentleaderboard.com/patent/4988405"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Fabrication of devices utilizing a wet etchback procedure

Fabrication of devices utilizing a wet etchback procedure

US Patent 4988405 · Granted Jan 29, 1991

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optical device with two cylindrically symmetric mirrors2015
In-situ removal of surface impurities prior to arsenic-doped polysilicon deposit2009
Structure and method for improved heat conduction for semiconductor devices2009
Structure and method for improved heat conduction for semiconductor devices2008
Test structure and method for yield improvement of double poly bipolar device2006
Polyelectrolyte dispensing polishing pad2006
Polyelectrolyte dispensing polishing pad, production thereof and method of polis2005
Method for forming an integrated barrier/plug for a stacked capacitor2002
Slurry-less chemical-mechanical polishing of oxide materials2002
Compositions for and method of reducing/eliminating scratches and defects in sil2001
Method of planarizing a surface on an integrated circuit2001
Electronic apparatus having improved scratch and mechanical resistance2001