Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Tungsten disilicide CVD

Tungsten disilicide CVD

US Patent 4966869 · Granted Oct 30, 1990

Estimated economic value: $9,157,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Linear wafer drive for handling wafers during semiconductor fabrication2018
Flexible laser manufacturing systems and associated methods of use and manufactu2016
Multi-stage air filtration systems and associated apparatuses and methods2015
Recirculating filtration systems for material processing systems and associated 2013
Method and apparatus for controlling the movement of CVD reaction byproduct gase2009
Method of inhibiting copper corrosion during supercritical CO2 cleaning2008
Method for supercritical carbon dioxide processing of fluoro-carbon films2007
System and method for processing a substrate using supercritical carbon dioxide 2007
Redistribution of copper deposited films2004
Method of passivating and stabilizing a Ti-PECVD process chamber and combined Ti2003
Method for enhancing the adhesion of a barrier layer to a dielectric2003
Method for stabilizing the internal surface of a PECVD process chamber2003