Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Pattern fabrication by radiation-induced graft copolymerization

Pattern fabrication by radiation-induced graft copolymerization

US Patent 4954424 · Granted Sep 4, 1990

Estimated economic value: $36,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Nitride crystal, semiconductor laminate, and method for manufacturing nitride cr2025
Control device2025
Voltage hold circuit, voltage monitoring circuit, and semiconductor integrated c2025
Wrapped joined V-belt2025
Circuit board assembly2025
Vehicular apparatus2024
Laser radiation system2024
Connector housing2024
Group-III nitride laminated substrate and semiconductor element2024
Group III nitride laminate, semiconductor element, and method for producing grou2024
Nitride crystal substrate and method for manufacturing the same2023
Laser irradiation method and laser irradiation system2023