Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Two layer dye photoresist process for sub-half micrometer resolution photolithography

Two layer dye photoresist process for sub-half micrometer resolution photolithography

US Patent 4906552 · Granted Mar 6, 1990

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Single crystal, dual wafer, tunneling sensor and a method of making same2004
Single crystal dual wafer, tunneling sensor and a method of making same2003
Method of fabricating a membrane-actuated charge controlled mirror (CCM)2000
Micro-dimensional coupling conductor2000
Method of making a micro-dimensional coupling conductor1997
Surface treatment of indium phosphide utilizing chemical roughening of the surfa1994