Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for forming photoresist pattern using contrast enhancement layer with abietic acid

Process for forming photoresist pattern using contrast enhancement layer with abietic acid

US Patent 4889795 · Granted Dec 26, 1989

Estimated economic value: $1,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Per- and polyfluoroalkyl compound-adsorbing activated carbon2025
Chemical liquid preparation device, and substrate processing device2025
Lubricating oil composition, buffer and method for using lubricating oil composi2025
Silicon etching solution and method for producing silicon device using the etchi2025
Solid-state imaging device2025
Substrate processing apparatus and substrate processing method2025
Control device for hybrid vehicle2024
Light source device and display unit2024
Petroleum resin, hydrogenated petroleum resin, and production method for hydroge2024
Chemical liquid preparation device, and substrate processing device2024
Substrate processing method and substrate processing apparatus2024
Classification system and learning system2024