Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Mask for ion, electron or X-ray lithography and method of making it

Mask for ion, electron or X-ray lithography and method of making it

US Patent 4855197 · Granted Aug 8, 1989

Estimated economic value: $13,639,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Biometric acoustic writing system and method for identifying individuals and rec2010
Droplet deposition apparatus2004
Undercut membrane mask for high energy photon patterning1994
Process for making masks with structures in the submicron range1991
Removal of particles from solid-state surfaces by laser bombardment1990
Removal of particles from solid-state surfaces by laser bombardment1990
Removal of particles from solid-state surfaces by laser bombardment1990
System for testing magnetic head/disk interfaces1988
Error-corrected corpuscular beam lithography1986
Magnetic head slider of ceramic material1985
Contact device for releasably connecting electrical components1985
Probe head arrangement for conductor line testing with at least one probe head c1985