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Home › Method of selective reactive ion etching of substrates

Method of selective reactive ion etching of substrates

US Patent 4826564 · Granted May 2, 1989

Estimated economic value: $25,785,000 ⓘ

Assignee

IBM

Inventors

Brian H. Desilets (13 patents)
Richard D. Kaplan (22 patents)
Harbans S. Sachdev (28 patents)
Krishna G. Sachdev (75 patents)
Susan Sanchez (3 patents)

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