Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › SOI process for forming a thin film transistor using solid phase epitaxy

SOI process for forming a thin film transistor using solid phase epitaxy

US Patent 4808546 · Granted Feb 28, 1989

Estimated economic value: $24,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electric cooker2025
Method for manufacturing measurement pipeline portion of ultrasonic flow meter2022
Clamp-on ultrasonic flow measuring device for accurately positioning on an exist2022
Solid-state imaging device and camera system2022
Clamp-type ultrasonic flow measuring apparatus with a mounter for press tight fi2021
Method for producing anti-fouling coating film, and anti-fouling coating film2021
Information processing apparatus, diagnosis method, and program2021
Honeycomb-shaped reaction vessel2020
Control system and control method, method and apparatus for processing informati2020
Vehicle interior component2020
Method of baking both sides of ingredients and an electric cooker used therefor2019
Semiconductor integrated circuit device and a method of manufacturing the same2019