Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7799690 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2010-09-21 |
| 7250376 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2007-07-31 |
| 7122469 | Fabrication process of a semiconductor integrated circuit device | Yoshikazu Tanabe, Isamu Asano, Makoto Yoshida, Naoki Yamamoto, Masayoshi Saito | 2006-10-17 |
| 7053007 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2006-05-30 |
| 7008880 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2006-03-07 |
| 6987069 | Fabrication process of a semiconductor integrated circuit device | Yoshikazu Tanabe, Isamu Asano, Makoto Yoshida, Naoki Yamamoto, Masayoshi Saito | 2006-01-17 |
| 6962880 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2005-11-08 |
| 6962881 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2005-11-08 |
| 6855642 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2005-02-15 |
| 6784116 | Fabrication process of a semiconductor integrated circuit device | Yoshikazu Tanabe, Isamu Asano, Makoto Yoshida, Naoki Yamamoto, Masayoshi Saito | 2004-08-31 |
| 6723665 | Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process | Yoshikazu Tanabe, Toshiaki Nagahama, Yasuhiko Nakatsuka | 2004-04-20 |
| 6602808 | Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process | Yoshikazu Tanabe, Toshiaki Nagahama, Yasuhiko Nakatsuka | 2003-08-05 |
| 6596650 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2003-07-22 |
| 6569780 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2003-05-27 |
| 6528403 | Fabrication process of a semiconductor integrated circuit device | Yoshikazu Tanabe, Isamu Asano, Makoto Yoshida, Naoki Yamamoto, Masayoshi Saito | 2003-03-04 |
| 6528431 | Method for fabricating semiconductor integrated circuit drive using an oxygen and hydrogen catalyst | Yoshikazu Tanabe, Satoshi Sakai | 2003-03-04 |
| 6521550 | Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process | Yoshikazu Tanabe, Toshiaki Nagahama, Yasuhiko Nakatsuka | 2003-02-18 |
| 6518202 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2003-02-11 |
| 6518201 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2003-02-11 |
| 6503819 | Fabrication process of a semiconductor integrated circuit device | Yoshikazu Tanabe, Isamu Asano, Makoto Yoshida, Naoki Yamamoto, Masayoshi Saito | 2003-01-07 |
| 6417114 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2002-07-09 |
| 6319860 | Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process | Yoshikazu Tanabe, Toshiaki Nagahama, Yasuhiko Nakatsuka | 2001-11-20 |
| 6239041 | Method for fabricating semiconductor integrated circuit device | Yoshikazu Tanabe, Satoshi Sakai | 2001-05-29 |
| 6197702 | Fabrication process of a semiconductor integrated circuit device | Yoshikazu Tanabe, Isamu Asano, Makoto Yoshida, Naoki Yamamoto, Masayoshi Saito | 2001-03-06 |
| 6066508 | Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process | Yoshikazu Tanabe, Toshiaki Nagahama, Yasuhiko Nakatsuka | 2000-05-23 |