Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Gas dispersion disk for use in plasma enhanced chemical vapor deposition reactor

Gas dispersion disk for use in plasma enhanced chemical vapor deposition reactor

US Patent 4792378 · Granted Dec 20, 1988

Estimated economic value: $5,225,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Controlling intensity over a surface of a light sensitive object2023
Controlling ultraviolet intensity over a surface of a light sensitive object2022
Wearable ultraviolet light phototherapy device2022
System and method for monitoring treatment of microelectronic substrates with fl2021
Surface treatment with ultraviolet light2021
Storage device including ultraviolet illumination2020
Semiconductor heterostructure with stress management2019
Material growth with temperature controlled layer2018
Semiconductor heterostructure with stress management2017
Semiconductor heterostructure with stress management2017
Method and apparatus for treating a workpiece with arrays of nozzles2017
Detection of lost wafer from spinning chuck2017