Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for producing a mask for use in X-ray photolithography and resulting structure

Method for producing a mask for use in X-ray photolithography and resulting structure

US Patent 4680243 · Granted Jul 14, 1987

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Device and method for enhancing transdermal flux of agents being delivered or sa2007
Dual focus lens with extended depth of focus2001
Device for enhancing transdermal agent delivery or sampling2001
Optical head with a diffractive lens for focusing a laser beam2000
Method for making an optical or magneto-optic head and the resulting head2000
Gray scale mask and depth pattern transfer technique using inorganic chalcogenid2000
Gray scale mask and depth pattern transfer technique using inorganic chalcogenid1999
Shape memory alloy microactuator having an electrostatic force and heating means1997
High sensitivity miniature pressure transducer1991
Solid state transducer and method of making same1988
Thermal fluid flow sensing method and apparatus for sensing flow over a wide ran1988
Process for manufacturing a mask for use in X-ray photolithography using a monol1987