Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus for performing plasma chemical vapor deposition

Apparatus for performing plasma chemical vapor deposition

US Patent 4676195 · Granted Jun 30, 1987

Estimated economic value: $351,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Cleaning liquid and method for manufacturing semiconductor device2025
Oxide catalyst and method for producing unsaturated nitrile2025
Driver abnormality determination apparatus, method and computer program2025
Soft X-ray static electricity removal apparatus2023
Automatic pallet changer in machine tool2023
Driver abnormality determination system, method and computer program2023
MEMS package, MEMS microphone and method of manufacturing the MEMS package2022
Thin-film filter, thin-film filter substrate, method of manufacturing the thin-f2022
Non-transitory computer-readable medium including figure data generation program2022
Method for manufacturing fuel cell and fuel cell2022
On-demand predefined route automated driving vehicle2022
On-demand predefined route automated driving vehicle2022