Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system

Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system

US Patent 4467211 · Granted Aug 21, 1984

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for processing substrate edges2014
Fiber-optic beam delivery system for wafer edge processing2013
Method and apparatus for processing substrate edges2013
Orthogonal beam delivery system for wafer edge processing2012
Scanning plasma reactor2007
Shaped biocompatible radiation shield and method for making same2006
Apparatus for local radiation therapy2002
Support system for a radiation treatment apparatus2001
Apparatus for local radiation therapy2001
Apparatus for local radiation therapy2001
Apparatus for applying X-rays to an interior surface of a body cavity1998
Method and apparatus for measuring radiation dose distribution1997