Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › X-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate)

X-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate)

US Patent 4225664 · Granted Sep 30, 1980

Estimated economic value: $29,375,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photoresist systems2011
Photoresist compositions2007
Polymers and photoresist compositions for short wavelength imaging2007
Polymers and photoresist compositions for short wavelength imaging2006
Fluorinated copolymers for microlithography2006
Fluorinated polymers having ester groups and photoresists for microlithography2005
Photoresist compositions for short wavelength imaging2005
Photoresist compositions particularly suitable for short wavelength imaging2005
Outgas prevention in electrooptical packages2004
Polymers and photoresist compositions2004
Polymers and photoresist compositions for short wavelength imaging2004
Optical fiber array and method of aligning optical fibers in the array2004