Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Precursors and flowable CVD methods for making low-K films to fill surface features

Precursors and flowable CVD methods for making low-K films to fill surface features

US Patent 12505999 · Granted Dec 23, 2025

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Organoaminodisilazanes for high temperature atomic layer deposition of silicon o2025
Compositions and methods using same for deposition of silicon-containing film2025
Compositions and methods using same for deposition of silicon-containing film2025
Compositions and methods using same for deposition of silicon-containing film2025
Compositions and methods using same for deposition of silicon-containing film2025
Compositions and methods using same for deposition of silicon-containing film2025
Silicon compounds and methods for depositing films using same2025
Silicon compounds and methods for depositing films using same2025
Silicon compounds and methods for depositing films using same2025
Silicon compounds and methods for depositing films using same2025
Compositions and methods using same for non-conformal deposition of silicon cont2025
Compositions and methods using same for deposition of silicon-containing film2025