Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming gate structures for nanostructures

Method of forming gate structures for nanostructures

US Patent 12484257 · Granted Nov 25, 2025

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device with backside power rail and methods of fabrication thereof2025
Semiconductor device and method2025
Semiconductor device and manufacturing method thereof2025
Semiconductor structure with source/drain multi-layer structure and method for f2025
Silicon intermixing layer for blocking diffusion2025
Semiconductor device and methods of formation2025
Contact metallization process2025
Formation and in-situ etching processes for metal layers2024
Method of manufacturing a semiconductor device and a semiconductor device2024
Gate structure and semiconductor device having the same2024
Methods for forming contact plugs with reduced corrosion2024
Semiconductor structure with source/drain multi-layer structure and method for f2024