Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Model-based characterization of plasmas in semiconductor processing systems

Model-based characterization of plasmas in semiconductor processing systems

US Patent 12476094 · Granted Nov 18, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Multi-zone gas distribution systems and methods2024
Apparatus for generating etchants for remote plasma processes2024
Two piece electrode assembly with gap for plasma control2024
Methods and apparatus for symmetrical hollow cathode electrode and discharge mod2024
Plasma ignition optimization in semiconductor processing chambers2024
Semiconductor processing chamber2023
Plasma ignition optimization in semiconductor processing chambers2023
Multi-zone gas distribution systems and methods2023
Semiconductor chamber coatings and processes2023
Methods and apparatus for symmetrical hollow cathode electrode and discharge mod2022
Multi-zone gas distribution systems and methods2021
Two piece electrode assembly with gap for plasma control2020