Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming structure of pellicle-mask structure with vent structure

Method for forming structure of pellicle-mask structure with vent structure

US Patent 12429760 · Granted Sep 30, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Mask for EUV lithography and method of manufacturing the same2025
Photomask pellicle including network of nanowires and method of forming the same2025
Extreme ultraviolet mask and method for forming the same2025
Pellicle design for mask application2025
Extreme ultraviolet mask and method of manufacturing the same2025
EUV photo masks and manufacturing method thereof2025
Pellicle for an EUV lithography mask and a method of manufacturing thereof2024
Pellicle for an EUV lithography mask and a method of manufacturing thereof2024
Pellicle for an EUV lithography mask and a method of manufacturing thereof2024
Extreme ultraviolet lithography method using robust, high transmission pellicle2024
Pellicle having vent hole2024
Method for forming structure of pellicle-mask structure with vent structure2024