Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Multi-beam charged particle source with alignment means

Multi-beam charged particle source with alignment means

US Patent 12224152 · Granted Feb 11, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Charged particle beam system, corrector for aberration correction of a charged p2025
Method for inspecting a sample using an assembly comprising a scanning electron 2025
Method for inspecting a specimen and charged particle beam device2025
Beam deflection device, aberration corrector, monochromator, and charged particl2024
Charged particle beam device for inspection of a specimen with a plurality of ch2024
Lithography system, sensor and measuring method2023
Lithography system, method of clamping and wafer table2023
Apparatus and method for inspecting a sample using a plurality of charged partic2021
Aberration correcting device for an electron microscope and an electron microsco2020
Lithography system, sensor and measuring method2020
Method for inspecting a sample using an assembly comprising a scanning electron 2020
Signal separator for a multi-beam charged particle inspection apparatus2019