Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Selective carbon deposition on top and bottom surfaces of semiconductor substrates

Selective carbon deposition on top and bottom surfaces of semiconductor substrates

US Patent 12125699 · Granted Oct 22, 2024

Estimated economic value: $83,950,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Gate structures for multi-gate devices2025
Method for determining immune competence against severe acute respiratory syndro2025
Effective work function tuning via silicide induced interface dipole modulation 2025
Hex wrench structure2025
Sidewall passivation for plasma etching2025
Metal caps for gate structures2025
Enhanced etch selectivity using halides2025
Metal gate for gate-all-around devices and methods for forming the same2025
Reducing aspect ratio dependent etch with direct current bias pulsing2025
Reducing aspect ratio dependent etch with direct current bias pulsing2025
Carbon gap fill processes2025
Carbon gap fill processes2025