Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma processing apparatus and method for dechucking wafer in the plasma processing apparatus

Plasma processing apparatus and method for dechucking wafer in the plasma processing apparatus

US Patent 12106942 · Granted Oct 1, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Turbocharger control device for vehicle and method of estimating base boost pres2025
Apparatus of hybrid vehicle and method thereof2025
Thermoelectric generator system and method2025
Method and apparatus for access control on ship network2025
Apparatus, method, and system for power consumption management of system-on-chip2025
Display device2025
Satellite antenna integrated time-synchronization device2024
Apparatus for controlling hybrid vehicle and method using the same2024
Retractable pet leash2024
Gas turbine engine2024
Method of secure and automated bootstrapping on keys and certificates for V2X en2024
Driving negotiation method and apparatus2024