Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Nitride semiconductor substrate, laminated structure, and method for manufacturing nitride semiconductor substrate

Nitride semiconductor substrate, laminated structure, and method for manufacturing nitride semiconductor substrate

US Patent 12091774 · Granted Sep 17, 2024

Estimated economic value: $19,251,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wearable device, control device, system, control method, and non-transitory comp2025
Nitride semiconductor substrate, laminated structure, and method for manufacturi2024
Method for manufacturing nitride semiconductor substrate, nitride semiconductor 2024
Wearable device, control device, system, control method, and non- transitory com2024
Nitride semiconductor substrate, method for manufacturing nitride semiconductor 2024
Nitride semiconductor substrate, laminate, substrate selection program, substrat2024
Method for manufacturing nitride semiconductor substrate, nitride semiconductor 2024
Method for manufacturing nitride semiconductor substrate and nitride semiconduct2024
Group III nitride crystal substrate having a diameter of 4 inches or more and a 2023
Image processing apparatus that performs processing concerning display of stereo2023
Crystal laminate, semiconductor device and method for manufacturing the same2023
Nitride crystal2022