Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Ambient controlled two-step thermal treatment for spin-on coating layer planarization

Ambient controlled two-step thermal treatment for spin-on coating layer planarization

US Patent 12087592 · Granted Sep 10, 2024

Estimated economic value: $10,912,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device and method of manufacture2025
Apparatus and method for use with a substrate chamber2025
Annealing apparatus and method of operating the same2025
Apparatus and method for use with a substrate chamber2025
Semiconductor device and methods of forming the same2025
Method of manufacturing a source/drain of a semiconductor device using multiple 2025
Semiconductor device and manufacturing method thereof2025
Semiconductor device having multi-layer epitaxial structures with different latt2025
Systems, methods, and semiconductor devices2025
Shallow trench isolation forming method and structures resulting therefrom2025
Semiconductor device2025
Source and drain engineering process for multigate devices2025