Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Magnetorheological-elastomer polishing pad for chemical mechanical polishing of semiconductor wafer, preparation method and application thereof

Magnetorheological-elastomer polishing pad for chemical mechanical polishing of semiconductor wafer, preparation method and application thereof

US Patent 12083647 · Granted Sep 10, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Angiography X-ray apparatus2025
Method for chemical mechanical polishing of a SiC wafer based on a magnetorheolo2025
Method for chemical mechanical polishing of a SiC wafer based on a magnetorheolo2025
Method for chemical mechanical polishing of a SiC wafer based on a magnetorheolo2025
Kinetic energy recovery system, method thereof and cutting device2024
On-chip packet caching apparatus, method and computer-readable medium using idle2024
Systems and methods for environment-adaptive robotic disinfection2024
Film laminator for cell phones2024
Film laminator for cell phones2023
Systems and methods for data management2022
Display panel and method of manufacturing the same, and display device2022
Quality detection device, quality detection method, and integrated probe assembl2022